Etching tanks used to perform Piranha, Hydrofluoric acid, or RCA clean on 4-inch wafer batches at LAAS technological facility in Toulouse, France.
The etching is used in microfabrication to chemically remove layers from the surface of a wafer during manufacturing. The etching is a critically important process module, and every wafer undergoes many etching steps before it is complete.
For many etching steps, part of the wafer is protected from the etchant by a "masking" material that resists etching. In some cases, the masking material is a photoresist that has been patterned using photolithography. Other situations require a more durable mask, such as silicon nitride.
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